Highly effective implantation method in the energy range 0.5-10 keV

Surface and Coatings Technology

Volumn 96, Issue 1, 1997, Pages 75-80

  Volosov, V I ^a   Churkin, I N ^a  

^a BUDKER INSTITUTE OF NUCLEAR PHYSICS   (Russian Federation)

Author keywords

Heavy atoms; Implantation; Intermediate energy; Source of atoms; Source of fast heavy atoms

Indexed keywords

ATOMIC BEAMS; ATOMS; CARBON; CATHODES; IONIZATION; IRRADIATION; NIOBIUM; PLASMAS; SPUTTERING; TITANIUM;

ATOMIC FLOW; ATOMIC IMPLANTATION; FAST HEAVY ATOM; INTERMEDIATE ENERGY; SPACE CHARGE LIMITATION;

ION IMPLANTATION;

EID: 0031551667     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00097-2     Document Type: Article

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