메뉴 건너뛰기




Volumn 96, Issue 1, 1997, Pages 52-57

High current-density broad-beam boron ion implantation

Author keywords

Boron; Ion implantation; Tribology

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; BORON; CONDENSATION; CURRENT DENSITY; DIFFUSION; MATERIALS TESTING; MICROSTRUCTURE; MOSSBAUER SPECTROSCOPY; SURFACES; THERMAL EFFECTS; TRIBOLOGY; X RAY DIFFRACTION;

EID: 0031551648     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00094-7     Document Type: Article
Times cited : (5)

References (14)
  • 4
    • 0027575614 scopus 로고
    • K.G. Budinski, Wear 162-164 (1993) 757-762
    • (1993) Wear , vol.162-164 , pp. 757-762
    • Budinski, K.G.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.