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Volumn 101, Issue 27, 1997, Pages 5377-5381

Mechanisms of SiO2 Etching: Ab initio calculations on the reactions of CFm- (m = 3-1) and NFn- (n = 2, 1) ions with local surface models

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; CHEMICAL BONDS; CHEMISORPTION; COMPUTATIONAL METHODS; DESORPTION; ETCHING; IONS; MATHEMATICAL MODELS; MOLECULAR STRUCTURE; THERMAL EFFECTS;

EID: 0031551216     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp970450m     Document Type: Article
Times cited : (1)

References (36)
  • 32
    • 0001685342 scopus 로고
    • Schaefer, H. F., III. Ed.; Plenum: New York, Chapter 4
    • Pulay, P. Modern Theoretical Chemistry; Schaefer, H. F., III. Ed.; Plenum: New York, 1977; Vol. 4, Chapter 4.
    • (1977) Modern Theoretical Chemistry , vol.4
    • Pulay, P.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.