Porous silicon field emitters for display applications

Applied Surface Science

Volumn 111, Issue , 1997, Pages 228-232

  Kleps, I ^a   Nicolaescu, D ^b   Lungu, C ^c   Musa, G ^c   Bostan, C ^a   Caccavale, F ^d  

^a Research Institute for Electronics Bucharest   (Romania)

^b NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

^c INSTITUTE OF ATOMIC PHYSICS   (Romania)

^d UNIVERSITY OF PADOVA   (Italy)

Author keywords

Field emission; Flat panel displays; Porous silicon

Indexed keywords

ANODIC OXIDATION; DISPLAY DEVICES; ELECTRON EMISSION; HYDROFLUORIC ACID; INTERFACES (MATERIALS); MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SILICON WAFERS; SURFACE STRUCTURE;

FLAT PANEL DISPLAYS; VACUUM FIELD EMISSION CURRENT;

POROUS SILICON;

EID: 0031550401     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00721-0     Document Type: Article

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