Chemical treatment of glass substrates

Journal of Non-Crystalline Solids

Volumn 222, Issue , 1997, Pages 429-434

  Couillard, J Gregory ^a   Ast, Dieter G ^a   Umbach, Christopher ^a   Blakely, Jack M ^a   Moore, Chad B ^a   Fehlner, Francis P ^a  

^a Department of Obstetrics Gynecology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL MODIFICATION; ELECTROMAGNETIC WAVE SCATTERING; LEACHING; RESISTORS; SCANNING ELECTRON MICROSCOPY; SILICA; SUBSTRATES; SURFACE CLEANING; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

X RAY SCATTERING;

GLASS;

EID: 0031549978     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(97)00385-2     Document Type: Article

References (9)