Magnetization and magnetoresistance in Fe-ion-implanted Cu and Ag thin films

Journal of Magnetism and Magnetic Materials

Volumn 173, Issue 3, 1997, Pages 230-240

  Pereira De Azevedo, M M ^a   Sousa, J B ^a   Mendes, J A ^a   Almeida, B G ^a   Rogalski, M S ^a   Pogorelov, Yu G ^a   Bibicu, I ^b   Redondo, L M ^c   Da Silva, M F ^c   Jesus, C M ^d   Marques, J G ^d   Soares, J C ^d  

^a UNIVERSITY OF PORTO   (Portugal)

^b INSTITUTE OF ATOMIC PHYSICS   (Romania)

^c NUCLEAR AND TECHNOLOGICAL INSTITUTE   (Portugal)

^d UNIVERSITY OF LISBON   (Portugal)

Author keywords

FeAg; FeCu; Granular alloy; Implantation; Magnetoresistance; M ssbauer spectroscopy

Indexed keywords

ANISOTROPY; ELECTRON SPECTROSCOPY; ION IMPLANTATION; LASER ABLATION; MAGNETIZATION; THIN FILMS;

ELECTRON MOSSBAUER SPECTROSCOPY; GRANULAR ALLOY; KONDO EFFECT; SPIN DEPENDENT SCATTERING;

MAGNETORESISTANCE;

EID: 0031549383     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-8853(97)00207-2     Document Type: Article

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