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Volumn 117-118, Issue , 1997, Pages 303-307
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Reactive deposition epitaxial growth of β-FeSi 2 layers on Si(001)
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Author keywords
Absorption coefficient; Direct band gap; Oriented layer; Reactive deposition epitaxy; FeSi 2
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Indexed keywords
ABSORPTION;
DEPOSITION;
ENERGY GAP;
EPITAXIAL GROWTH;
PHASE TRANSITIONS;
SUBSTRATES;
ABSORPTION COEFFICIENT;
IRON SILICIDE;
REACTIVE DEPOSITION EPITAXY (RDE);
IRON COMPOUNDS;
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EID: 0031548143
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/S0169-4332(97)80098-0 Document Type: Article |
Times cited : (38)
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References (16)
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