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Applied Surface Science

Volumn 117-118, Issue , 1997, Pages 26-31

Infrared and Raman study of H-terminated Si(100) surfaces produced by etching solutions

(3) Miyata, N a Watanabe, S a Okamura, S a

a FUJITSU LABORATORIES LTD (Japan)

Author keywords

Depolarised measurement; Dihydride; H terminated Si(100); Infrared spectroscopy; Raman spectroscopy

Indexed keywords

CRYSTAL ORIENTATION; ETCHING; HYDRIDES; HYDROGEN; INFRARED SPECTROSCOPY; RAMAN SPECTROSCOPY; SEMICONDUCTING FILMS; SOLUTIONS; SURFACE STRUCTURE; THIN FILMS;

DEPOLARIZATION; DIHYDRIDES;

SEMICONDUCTING SILICON;

EID: 0031548139 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(97)80046-3 Document Type: Article

Times cited : (8)

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