Computer simulation of ion sputtering of polyatomic multilayered targets

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 127-128, Issue , 1997, Pages 286-290

  Ber, B J ^a   Kharlamov, V S ^b   Kudrjavtsev, Yu A ^a   Merkulov, A V ^a   Trushin, Yu V ^a   Zhurkin, E E ^b  

^a IOFFE INSTITUTE   (Russian Federation)

^b PETER THE GREAT ST PETERSBURG POLYTECHNIC UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; COMPUTER SIMULATION; COMPUTER SOFTWARE; HETEROJUNCTIONS; ION BEAMS; ION IMPLANTATION; MOLECULAR BEAM EPITAXY; MONTE CARLO METHODS; MULTILAYERS; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM ARSENIDE;

BINARY COLLISION APPROXIMATION; POLYATOMIC TARGETS; SOFTWARE PACKAGE DYTRIRS; SOFTWARE PACKAGE TRIRS;

SPUTTERING;

EID: 0031547906     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(96)00941-X     Document Type: Article

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