Reduction of stresses in thin films by high energy ion beams

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 127-128, Issue , 1997, Pages 43-45

  Jain, Amitabh ^a,c   Loganathan, S ^a,d   Jain, Uma ^b  

^a INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

^b UNIVERSITY OF DELHI   (India)

^c TEXAS INSTRUMENTS   (United States)

^d Titan Industries Ltd   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; CHROMIUM; CRYSTAL LATTICES; DOSIMETRY; FILM GROWTH; ION BOMBARDMENT; MATHEMATICAL MODELS; NICKEL; STRAIN MEASUREMENT; TENSILE STRENGTH; THIN FILMS; X RAY CRYSTALLOGRAPHY;

SCRATCH ADHESION MEASUREMENTS;

METALLIC FILMS;

EID: 0031547749     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(96)00850-6     Document Type: Article

References (11)

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