Etching of amorphous Al2O3 produced by ion implantation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 127-128, Issue , 1997, Pages 596-598

  McHargue, Carl J ^a   Hunn, John D ^a   Joslin, Debra L ^b   Alves, E ^c   Da Silva, M F ^c   Soares, J C ^c  

^a UNIVERSITY OF TENNESSEE   (United States)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

^c INSTITUTO TECNOLÓGICO E NUCLEAR   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; AMORPHOUS MATERIALS; CHEMICAL ATTACK; CHROMIUM; DISSOLUTION; ETCHING; ION BOMBARDMENT; ION IMPLANTATION; NITRIC ACID; OXYGEN; TIN; ZIRCONIUM;

CHEMICAL REACTIVITY; ION BEAM MIXING;

ALUMINA;

EID: 0031547718     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(96)01139-1     Document Type: Article

References (10)

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