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Volumn 127-128, Issue , 1997, Pages 406-409
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Low energy BF2 implantation for the suppression of B penetration
a
NEC CORPORATION
(Japan)
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Author keywords
[No Author keywords available]
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Indexed keywords
BORON COMPOUNDS;
DIFFUSION IN SOLIDS;
FLUORINE;
GATES (TRANSISTOR);
INTERFACES (MATERIALS);
ION IMPLANTATION;
OXIDES;
POLYCRYSTALLINE MATERIALS;
SEMICONDUCTOR DEVICE MANUFACTURE;
GATE OXIDES;
MOS DEVICES;
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EID: 0031547638
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/S0168-583X(96)00965-2 Document Type: Article |
Times cited : (7)
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References (10)
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