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Volumn 113-114, Issue , 1997, Pages 130-134

Optical and structural studies of nanocrystalline silicon thin film grown by rapid thermal annealing

(4) Toyama, Toshihiko a Ouchida, Takashi a Okamoto, Hiroaki a Hamakawa, Yoshihiro a

Author keywords

Infrared absorption; Nanocrystalline Si; Optical absorption coefficient; Photoluminescence; Rapid thermal annealing; Thermoabsorption spectroscopy

Indexed keywords

ABSORPTION SPECTROSCOPY; AMORPHOUS SILICON; ANNEALING; CRYSTAL STRUCTURE; GRAIN SIZE AND SHAPE; LIGHT EMISSION; NANOSTRUCTURED MATERIALS; PHOTOLUMINESCENCE; THERMAL EFFECTS; THIN FILMS; VACUUM APPLICATIONS;

BLUE BAND LIGHT EMISSION; INFRARED ABSORPTION; NANOCRYSTALLINE SILICON; OPTICAL ABSORPTION COEFFICIENT; THERMOABSORPTION SPECTROSCOPY;

FILM GROWTH;

EID: 0031547430 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(96)00892-6 Document Type: Article

Times cited : (2)

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