|
Volumn 113-114, Issue , 1997, Pages 556-561
|
Interfacial reactions of ultrahigh vacuum deposited Er-Si multilayer thin films
|
Author keywords
Amorphous interlayer; Erbium silicide; Multilayer
|
Indexed keywords
AMORPHOUS ALLOYS;
ANNEALING;
CHEMICAL REACTIONS;
COMPOSITION;
ERBIUM COMPOUNDS;
INTERFACES (MATERIALS);
METALS;
MULTILAYERS;
STABILITY;
TRANSMISSION ELECTRON MICROSCOPY;
ERBIUM SILICIDE;
INTERFACIAL REACTIONS;
THIN FILMS;
|
EID: 0031547297
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/S0169-4332(96)00800-8 Document Type: Article |
Times cited : (4)
|
References (21)
|