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Volumn 113-114, Issue , 1997, Pages 9-17
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Fabrication and characterization of epitaxial films of ionic materials
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Author keywords
Alkali halide; Growth mechanism; Hetero epitaxy; Interface
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Indexed keywords
CRYSTAL LATTICES;
DISLOCATIONS (CRYSTALS);
INTERFACES (MATERIALS);
LITHIUM COMPOUNDS;
SEMICONDUCTING GALLIUM ARSENIDE;
SEMICONDUCTING SILICON;
SUBSTRATES;
THIN FILMS;
ALKALI HALIDES;
HETERO EPITAXY;
IONIC MATERIALS;
LITHIUM BROMIDE;
EPITAXIAL GROWTH;
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EID: 0031547252
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/S0169-4332(96)00888-4 Document Type: Article |
Times cited : (32)
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References (40)
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