X-ray diffraction patterns of C 60 films by the thin film method and the intercalation of O 2

Applied Surface Science

Volumn 113-114, Issue , 1997, Pages 282-285

  Itoh, Takashi ^a   Nitta, Shoji ^a   Nonomura, Shuichi ^a  

^a GIFU UNIVERSITY   (Japan)

Author keywords

C 60; Crystallinity; Films; Gas effusion spectra; Intercalation of O 2; Thin film method

Indexed keywords

CARBON; OXYGEN; SEMICONDUCTING SILICON; SUBSTRATES; X RAY CRYSTALLOGRAPHY;

CARBON FILM; CRYSTALLINITY; GAS EFFUSION SPECTRA; INTERCALATION; THIN FILM METHOD;

THIN FILMS;

EID: 0031547176     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00951-8     Document Type: Article

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