Study on the effect of the interlay er on the adhesion of 400 μm thick film

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 121, Issue 1-4, 1997, Pages 212-215

  Murakami, Y ^a   Kuratani, N ^a   Nishiyama, S ^a   Imai, O ^a   Ogata, K ^a  

^a NISSIN ELECTRIC CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; INTERFACES (MATERIALS); ION BEAMS; NICKEL; SUBSTRATES; THICK FILMS; TUNGSTEN CARBIDE; VAPOR DEPOSITION;

ION BEAM EFFECTS;

TITANIUM NITRIDE;

EID: 0031546198     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(96)00399-0     Document Type: Article

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3. A. Nakayama, T. Yoshioka and T. Nomura, in: Surface Modification Technologies, eds. T.S. Sudarshan, K. Ishizaki, M. Takata and K. Kamata (The Institute of Materials, 1994) p. 315.
4. K. Ogata, Y. Andoh and Kamijo, Nucl. Instr. and Meth. B 33 (1988) 685.
5. N. Kuratani, O. Imai, A. Ebe, S. Nishiyama and K. Ogata, Surf. Coat. Technol. 66 (1994) 310.