Characterization of ion implanted TiN films

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 121, Issue 1-4, 1997, Pages 283-287

  Oda, K ^a   Nakayama, A ^a   Ohara, H ^a   Kitagawa, N ^a   Nomura, T ^a  

^a SUMITOMO ELECTRIC INDUSTRIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CHROMIUM; FILMS; ION IMPLANTATION; IONS; MICROSTRUCTURE; TRIBOLOGY; VAPOR DEPOSITION; WEAR RESISTANCE;

ION IMPLANTED FILMS;

TITANIUM NITRIDE;

EID: 0031546193     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(96)00548-4     Document Type: Article

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