Role of low-energy secondary electrons in synchrotron radiation-excited chemical vapor deposition of silicon nitride films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 5, 1997, Pages 2644-2652

  Kyuragi, Hakaru ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031533975     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580936     Document Type: Article

References (52)

1. F. Cerrina, B. Lai, G. M. Wells, J. R. Wiley, D. G. Kilday, and G. Margaritondo, Appl. Phys. Lett. 50, 533 (1987).
2. Y. Takakuwa, M. Nogawa, M. Niwano, H. Katakura, S. Matsuyoshi, H. Ishida, H. Kato, and N. Miyamoto, Jpn. J. Appl. Phys., Part 2 28, L1274 (1989).
3. H. Akazawa, Y. Utsumi, J. Takahashi, and T. Urisu, Appl. Phys. Lett. 57, 2302 (1990).
4. H. Kyuragi and T. Urisu, J. Appl. Phys. 61, 2035 (1987).
5. D. C. Mancini, S. Varma, J. K. Simons, R. A. Rosenberg, and P. A. Dowben, J. Vac. Sci. Technol. B 8, 1804 (1990).
6. Y. Matsui, R. Nagayoshi, M. Nakamura, M. Okuyama, and Y. Hamakawa, Jpn. J. Appl. Phys., Part 1 31, 1972 (1992).
7. T. Urisu and H. Kyuragi, J. Vac. Sci. Technol. B 5, 1436 (1987).
8. N. Hayasaka, A. Hiraya, and K. Shobatake, Jpn. J. Appl. Phys., Part 2 26, L1110 (1987).
9. K. Shobatake, H. Ohashi, K. Fukui, A. Hiraya, N. Hayasaka, H. Okano, A. Yoshida, and H. Kume, Appl. Phys. Lett. 56, 2189 (1990).
10. S. Terakado, K. Kaneda, S. Suzuki, and K. Tanaka, J. Vac. Sci. Technol. A 12, 379 (1994).
11. J. Takahashi, Y. Utsumi, H. Akazawa, I. Kawashima, and T. Urisu, Appl. Phys. Lett. 58, 2776 (1991).
12. Y. Utsumi, J. Takahashi, H. Akazawa, and T. Urisu, Jpn. J. Appl. Phys., Part 1 30, 3195 (1991).
13. J. Takahashi, Y. Utsumi, and T. Urisu, J. Appl. Phys. 70, 2958 (1991).
14. H. Kyuragi and T. Urisu, J. Electrochem. Soc. 138, 3412 (1991).
15. F. Uesugi and I. Nishiyama, Appl. Surf. Sci. 62, 151 (1992).
16. F. Uesugi and I. Nishiyama, IEICE Trans. E76-C, 47 (1993).
17. Y. Nara, Y. Sugita, K. Horiuchi, and T. Ito, Jpn. J. Appl. Phys., Part 1 31, 2333 (1992).
18. R. Zanoni, M. N. Piancastelli, M. Marsi, and G. Margaritoudo, Solid State Commun. 76, 1239 (1990).
19. R. Zanoni, M. N. Piancastelli, J. Mckinley, and G. Margaritoudo, Appl. Phys. Lett. 55, 1020 (1989).
20. T. Urisu, H. Kyuragi, Y. Utsumi, J. Takahashi, and M. Kitamura, Rev. Sci. Instrum. 60, 2157 (1989).
21. T. H. Wood, J. C. White, and B. A. Thacker, Appl. Phys. Lett. 42, 408 (1983).
22. M. Kobayashi, Proceedings of the 5th Symposium on Accelerator Science Technology (National Laboratory for High Energy Physics, Tsukuba, 1984), p. 250.
23. J. Schwinger, Phys. Rev. 75, 1912 (1949).
24. Handbook of Optical Constants of Solids, edited by E. D. Palik (Academic, New York, 1985), p. 333.
25. M. Suto and L. C. Lee, J. Chem. Phys. 84, 1160 (1986).
26. Y. Hatano (private communication).
27. J. Berkowitz, Photoabsorption, Photoionizarion, and Photoelectron Spectroscopy (Academic, New York, 1979), p. 96.
28. T. E. Allen, R. R. Kunz, and T. M. Mayer, J. Vac. Sci. Technol. B 6, 2057 (1988).
29. B. L. Henke and M. W. Anderson, X-ray Optics and Micoranalysis, edited by G. Shinoda, K. Kohra, and T. Ichikawa (Univ. of Tokyo Press, Tokyo, 1972), p. 367.
30. J. P. M. Schmitt, J. Non-Cryst. Solids 59&60, 649 (1983).
31. P. C. Cosby, J. Chem. Phys. 98, 7544 (1993).
32. D. Rapp and P. E. Golden, J. Chem. Phys. 43, 1404 (1965).
33. Handbook of Optical Constants of Solids, edited by E. D. Palik (Academic, New York, 1985), p. 547.
34. K. Goto and K. Ishikawa, J. Appl. Phys. 43, 1559 (1972).
35. G. F. Amelio, J. Vac. Sci. Technol. 7, 593 (1970).
36. K. Murata and D. F. Kyser, Advances Electronics and Electron Physics (Academic, New York, 1987), Vol. 69, p. 175.
37. T. Koshikawa and R. Shimizu, Ohyo Butsuri 44, 215 (1975) [in Japanese].
38. T. Koshikawa and R. Shimizu, J. Phys. D 7, 1303 (1974).
39. Y. Itikawa, M. Hayashi, A. Ichimura, K. Onda, K. Sakimoto, K. Takayanagi, M. Nakamura, H. Nishimura, and T. Takayanagi, J. Phys. Chem. Ref. Data 15, 985 (1986).
40. H. Sambe, D. E. Ramarker, M. Deschenes, A. D. Bass, and L. Sanche, Phys. Rev. Lett. 64, 523 (1990).
41. X.-L. Zhou and J. M. White, J. Chem. Phys. 92, 1504 (1990).
42. L. Sanche, J. Phys. B 23, 1597 (1990).
43. J. Berkowitz, Photoabsorption, Photoionization, and Photoelectron Spectroscopy (Academic, New York, 1979), p. 125.
44. D. E. Ramaker, J. Vac. Sci. Technol. A 1, 1137 (1983).
45. F. Bozso and Ph. Avouris, Phys. Rev. Lett. 57, 1185 (1986).
46. B. M. W. Tranpnell, Proc. R. Soc. London, Ser. A 206, 39 (1951).
47. L. Kubler, E. K. Hlil, D. Bomont, and J. C. Peruchetti, Thin Solid Films 149, 385 (1987).
48. L. Kubler, E. K. Hlil, D. Bomont, and G. Gewinner, Surf. Sci. 183, 503 (1987).
49. D. T. Birtwistle and A. Herzenberg, J. Phys. B 4, 53 (1971).
50. L. G. Christouphorou, J. G. Carter, and D. V. Maxey, J. Chem. Phys. 76, 2653 (1982).
51. J. I. Yeh and I. Lindau, At. Data Nucl. Data Tables 32, 1 (1985).
52. S. R. Morrison, The Chemical Physics of Surfaces (Plenum, New York, 1977), especially Chap. 9.