Plasma nitriding combined with a hollow cathode discharge sputtering at high pressures

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 5, 1997, Pages 2636-2643

  Benda, M ^a   Vlcek J ^a   Cibulka, V ^a   Musil, J ^b  

^a UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

^b INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031516763     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580935     Document Type: Article

References (7)

1. M. Benda, J. Vlček, and J. Musil, Vacuum 46, 43 (1995).
2. B. Schaefer and K. H. Schoenbach, Basic Mechanisms Contributing to the Hollow Cathode Effect, in Physics and Applications of Pseudosparks, edited by M. A. Gundersen and G. Schaefer, NATO ASI Series B, Vol. 219 (Plenum, New York, 1990), p. 55.
3. H. Koch, L. J. Friedrich, V. Hinkel, F. Ludwig, B. Politt, and T. Schurig, J. Vac. Sci. Technol. A 9, 2374 (1991).
4. M. Sugawara and T. Asami, Surf. Coat. Technol. 74/75, 355 (1995).
5. V. I. Kolobov and L. D. Tsendin, Plasma Sources Sci. Technol. 4, 551 (1995).
6. K. H. Schoenbach, R. Verhappen, T. Tessnow, F. E. Peterkin, and W. W. Byszewski, Appl. Phys. Lett. 68, 13 (1996).
7. B. Chapman, Glow Discharge Processes (Wiley, New York, 1980), p. 108.