Microstructural change of TiN films by C and B ion implantations

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 5, 1997, Pages 2609-2614

  Ohara, H ^a   Nakayama, A ^a   Nomura, T ^a  

^a SUMITOMO ELECTRIC INDUSTRIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031512947     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580780     Document Type: Article

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