Electronic Structure and Electrical Conductivity of Amorphous Ni-Si Alloy Films

Journal of the Physical Society of Japan

Volumn 66, Issue 7, 1997, Pages 2103-2109

  Isobe, Atsuo ^a   Yamada, Masaaki ^a   Tanaka, Kazuhide ^a  

^a NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Amorphous Ni Si alloy; Core level shift; Density of states; Electrical conductivity; Metal insulator transition; Mobility edge; UPS; XPS

Indexed keywords

EID: 0031506757     PISSN: 00319015     EISSN: None     Source Type: Journal    
DOI: 10.1143/JPSJ.66.2103     Document Type: Article

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