Observation of SiO 2 thickness variations on Si using AFM and SCM

Journal of the Korean Physical Society

Volumn 31, Issue SUPPL. PART 1, 1997, Pages

  Kang, Chi Jung ^a   Kim, G K ^a   Kahng, S J ^a   Khang, Y ^a   Lee, S J ^a   Kuk, Young ^a   Mang, K M ^b  

^a Seoul National University   (South Korea)

^b SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031502966     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (10)

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