Influence of interface thermal conductance on the apparent thermal conductivity of thin films

Microscale Thermophysical Engineering

Volumn 1, Issue 1, 1997, Pages 47-52

  Lee, S M ^a   Cahill, David G ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031497617     PISSN: 10893954     EISSN: 10893954     Source Type: Journal    
DOI: 10.1080/108939597200421     Document Type: Article

References (10)

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2. O. W. ICading, H. Skurk, and K. E. Goodson. Thermal Conductance in Metallized Silicon-Dioxide Layers on Silicon, Appl. Phys. Lett., vol. 65, pp. 1629-1631, 1994.
3. R. J. Stoner and H. J. Maris. Kapitza Conductance and Heat Flow between Solids at Temperatures from 50 to 300 K, Phys. Rev. B, vol. 48. pp. 16373-16387. 1993.
4. S.-M. Lee and David G. Cahill. Heat Transport in Thin Dielectric Films, unpublished.
5. David G. Cahill, Thermal Conductivity Measurement from 30 to 750 K: The 3? Method, Rev. Sei. Instrum., vol. 61, pp. 802-808. 1990.
6. David G. Cahill, M. Katiyar, and J. R. Abelson, Thermal Conductivity of a-Si:H Thin Films, Phys. Rev. B. vol. 50, pp. 6077-6081. 1994.
7. S.-M. Lee, David G. Cahill, and Thomas H. Allen, Thermal Conductivity of Sputtered Oxide Films, Phys. Rev. B. vol. 52, pp. 253-257, 1995.
8. David G. Cahill, S. K. Watson, and R. O. Pohl, Lower Limit to the Thermal Conductivity of Disordered Crystals, Phys. Rev. B, vol. 46, pp. 6131-6140, 1992.
9. E.T. Swartz and R. O. Pohl, Thermal Resistance at Interfaces, Appl. Phys. Lett., vol. 51, pp. 2200-2202, 1987.
10. D. G. Cahill, R. B. Stephens, R. H. Tait, S. K. Watson, and R. O. Pohl, in C. J. Cremers and H. A. Fine (eds.). Thermal Conditetivity, vol. 21, pp. 3-16, Plénum, New York, 1990.