Determination of ultratrace metallic impurities in silicon wafers by acid vapor decomposition/electrothermal vapolization ICP-MS

Bunseki Kagaku

Volumn 46, Issue 9, 1997, Pages 743-747

  Takenaka, Miyuki ^a   Yamada, Yuji ^a   Hayashi, Masaru ^a   Omori, Hirohumi ^a   Ito, Syoko ^a   Okada, Akira ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Acid vapor decomposition; Electrothermal vaporization ICP MS; Metallic impurity; Silicon wafer

Indexed keywords

EID: 0031493297     PISSN: 05251931     EISSN: None     Source Type: Journal    
DOI: 10.2116/bunsekikagaku.46.743     Document Type: Article

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