Ferroelectric PbZr1-xTixO3 thin films made by various metalorganic chemical vapor deposition techniques

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3008, Issue , 1997, Pages 359-364

  Li, Tingkai ^a   Zawadzki, Pate ^a   Stall, Rick A ^a   Kroll, William J ^a  

^a EMCORE CORPORATION   (United States)

Author keywords

Ferroelectrics; MOCVD; PZT; Thin film

Indexed keywords

FATIGUE OF MATERIALS; FERROELECTRICITY; GRAIN GROWTH; GRAIN SIZE AND SHAPE; LEAD COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROSTRUCTURE; NUCLEATION; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SAPPHIRE; SILICON WAFERS; SINGLE CRYSTALS; SUBSTRATES; THERMAL EFFECTS;

PHASE FORMATION;

FERROELECTRIC THIN FILMS;

EID: 0031389513     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.271435     Document Type: Conference Paper

References (19)