CMOS transistor reliability and performance impacted by gate microstructure

International Integrated Reliability Workshop Final Report

Volumn , Issue , 1997, Pages 35-41

  Yu, Bin ^a   King, Tsu Jae ^a   Hu, Chenming ^a   Ju, Dong Hyuk ^a   Kepler, Nick ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CMOS INTEGRATED CIRCUITS; GATES (TRANSISTOR); GRAIN BOUNDARIES; MICROSTRUCTURE; MOSFET DEVICES; NITROGEN; RELIABILITY; SEMICONDUCTING BORON; TRANSCONDUCTANCE;

GATE MICROSTRUCTURE; IMPURITY DIFFUSION;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0031388380     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)