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Volumn 482, Issue , 1997, Pages 131-136
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Microstructural evaluation of ZnO thin films deposited by MOCVD
a a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
DISLOCATIONS (CRYSTALS);
EPITAXIAL GROWTH;
FILM GROWTH;
INTERFACES (MATERIALS);
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
MICROSTRUCTURE;
MORPHOLOGY;
SAPPHIRE;
SEMICONDUCTING ZINC COMPOUNDS;
SUBSTRATES;
THIN FILMS;
ZINC OXIDE;
HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY (HRTEM);
SEMICONDUCTING FILMS;
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EID: 0031388247
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-482-131 Document Type: Conference Paper |
Times cited : (1)
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References (8)
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