Reactive ion etch of silicon nitride spacer with high selectivity to oxide

IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop

Volumn , Issue , 1997, Pages 252-256

  Regis, J M ^a   Joshi, A M ^a   Lill, T ^a   Yu, M ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; MOSFET DEVICES; OXIDES; REACTIVE ION ETCHING; SILICON NITRIDE; SILICON WAFERS; THIN FILMS;

MAGNETICALLY ENHANCED REACTIVE ION ETCHING; SILICON NITRIDE SPACER;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031387136     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)