Pulsed laser deposition of PZTTBaRuO3 Bi-layered films on silicon substrate

Ferroelectrics

Volumn 195, Issue 1-4, 1997, Pages 199-202

  Xu, W Ping ^a   Gu, Mei ^b   Zheng, Lirong ^a   Xin, Huoping ^a   Cao, Zechun ^b   Okuyama, Masanori ^c   Lin, Chenglu ^a  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b SHANGHAI UNIVERSITY   (China)

^c OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BARIUM COMPOUNDS; CONDUCTIVE FILMS; CRYSTAL ORIENTATION; CRYSTALLIZATION; DEPOSITION; EXCIMER LASERS; HIGH TEMPERATURE EFFECTS; LEAD COMPOUNDS; PULSED LASER APPLICATIONS; SEMICONDUCTING SILICON; THIN FILMS;

BARIUM RUTHENIUM OXIDE; LEAD ZIRCONATE TITANATE; PULSED LASER DEPOSITION;

DIELECTRIC FILMS;

EID: 0031386384     PISSN: 00150193     EISSN: None     Source Type: Journal    
DOI: 10.1080/00150199708260520     Document Type: Article

References (8)

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6. W-ping Xu, Yiqing Chen, Lirong Zheng, Masanori Okuyama and Chenglu Lin, to be published on Phys. Stat. Sol.(a).
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8. W-ping Xu, Huoping Xin, Chenglu Lin, et al., submitted to Materials Letters.