Use of a CSLM for the analysis of chemical etched tracks in PADC

Radiation Measurements

Volumn 28, Issue 1-6, 1997, Pages 845-848

  Meesen, G ^a   Van Oostveldt, P ^b  

^a GHENT UNIVERSITY   (Belgium)

^b Lab for Biochemistry and Molecular Cytology   (Belgium)

Author keywords

Chemical etching; Confocal scanning laser microscope; Fluorescence; PADC

Indexed keywords

ALPHA PARTICLES; ETCHING; FLUORESCENCE; IMAGE QUALITY; LASER APPLICATIONS; MICROSCOPIC EXAMINATION; PARTICLE DETECTORS; POLYCARBONATES;

CONFOCAL SCANNING LASER MICROSCOPES (CSLM); POLYALLYLDIGLYCOL CARBONATE; POLYMERIC TRACK DETECTORS;

PARTICLE BEAM TRACKING;

EID: 0031386116     PISSN: 13504487     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1350-4487(97)00195-9     Document Type: Article

References (2)

1. Hell S., Reiner G., Cremer C. and Stelzer E.H.K. (1993) Aberrations in confocal fluorescence microscopy induced by mismatches in refractive index. Journal of Microscopy 169, 391-405.
2. Jakes J., Gais P. And Schraube H. (1995) Confocal microscopy in the analysis of the etched nuclear particle tracks in polymers. Journal of Microscopy 177, 77-84.