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Volumn 470, Issue , 1997, Pages 319-324

Deep diffusions and SOI layers produced by rapid thermal processing for smart power applications

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; BORON; CRYSTALLIZATION; DIFFUSION; EPITAXIAL GROWTH; MELTING; SILICON WAFERS; THERMAL GRADIENTS;

EID: 0031384983     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-470-319     Document Type: Conference Paper
Times cited : (2)

References (15)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.