Stress control in sputtered silicon nitride films

Materials Research Society Symposium - Proceedings

Volumn 472, Issue , 1997, Pages 239-244

  Mescher, M J ^a   Reed, M L ^a   Schlesinger, T E ^a  

^a CARNEGIE MELLON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MAGNETRON SPUTTERING; PRESSURE EFFECTS; SILICON NITRIDE; SPUTTER DEPOSITION; STRESS ANALYSIS; THIN FILM CIRCUITS;

GAS FLOW RATIO; GAS MIXTURE RATIO; PEENING MODELS; STRESS CONTROL;

SEMICONDUCTING FILMS;

EID: 0031384920     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-472-239     Document Type: Conference Paper

References (15)