Chemical-mechanical polishing of polymer films: Comparison of benzocyclobutene (BCB) and parylene-N films by XPS and AFM

Materials Research Society Symposium - Proceedings

Volumn 476, Issue , 1997, Pages 161-172

  Yang, G R ^a   Zhao, Y P ^a   Neirynck, Jan M ^a   Murarka, Shyam P ^a   Gutmann, Ronald J ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AROMATIC POLYMERS; ATOMIC FORCE MICROSCOPY; CHEMICAL POLISHING; CHEMICAL RESISTANCE; DEPOSITION; MOLECULAR STRUCTURE; MORPHOLOGY; ROUGHNESS MEASUREMENT; SLURRIES; SURFACE ROUGHNESS; THERMODYNAMIC STABILITY; X RAY PHOTOELECTRON SPECTROSCOPY;

BENZOCYCLOBUTENE; CHEMICAL MECHANICAL POLISHING; PARYLENE;

PLASTIC FILMS;

EID: 0031384602     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-476-161     Document Type: Conference Paper

References (12)