Studies of physical vapour deposition interfaces generated by Ti ions in a steered arc discharge

Surface and Coatings Technology

Volumn 97, Issue 1-3, 1997, Pages 713-718

  Davidson, J L ^a   Brooks, J S ^a   Forder, S D ^a   Munz W D ^a  

^a SHEFFIELD HALLAM UNIVERSITY   (United Kingdom)

Author keywords

CEMS; Interfaces; PDV

Indexed keywords

ADHESION; ELECTRON SPECTROSCOPY; INTERFACES (MATERIALS); ISOTOPES; MAGNETRON SPUTTERING; MOSSBAUER SPECTROSCOPY; SPUTTER DEPOSITION; STEEL; SUBSTRATES; TITANIUM CARBIDE; TITANIUM NITRIDE; VAPOR DEPOSITION;

CONVERSION ELECTRON MOESSBAUER SPECTROSCOPY (CEMS); PHYSICAL VAPOR DEPOSITION (PVD);

CERAMIC COATINGS;

EID: 0031384065     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00337-X     Document Type: Article

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