Practical method of evaluating two-dimensional resist features for lithographic DRC

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3051, Issue , 1997, Pages 499-508

  Futatsuya, Hiroki ^a   Chijimatsu, Tatsuo ^a   Asai, Satoru ^a   Hanyu, Isamu ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DESIGN; IMAGE PROCESSING; OPTIMIZATION; PHOTORESISTS; PROXIMITY SENSORS; VLSI CIRCUITS;

AERIAL IMAGES; DESIGN RULE CHECK; OPTICAL MICROLITHOGRAPHY; OPTICAL PROXIMITY CORRECTION;

PHOTOLITHOGRAPHY;

EID: 0031383581     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.275985     Document Type: Conference Paper

References (3)