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Volumn 3051, Issue , 1997, Pages 652-657
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Calculation and simulation of intensity distribution of uniform-illumination optical systems for submicron photolithography
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Author keywords
[No Author keywords available]
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Indexed keywords
COMPUTER SIMULATION;
COMPUTER SOFTWARE;
EXCIMER LASERS;
OPTICAL SYSTEMS;
INTENSITY DISTRIBUTION;
OPTICAL MICROLITHOGRAPHY;
SOFTWARE PACKAGE CALOSD;
PHOTOLITHOGRAPHY;
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EID: 0031382538
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.276059 Document Type: Conference Paper |
Times cited : (2)
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References (3)
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