Structural properties of a-Ge1-xCx:H alloys prepared by the RF sputtering technique

Materials Research Society Symposium - Proceedings

Volumn 467, Issue , 1997, Pages 537-542

  Marques, F C ^a   Vilcarromero, J ^a   Freire Jr , F L ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS ALLOYS; CHEMICAL VAPOR DEPOSITION; GERMANIUM ALLOYS; INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; REFRACTIVE INDEX; RESIDUAL STRESSES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; STRUCTURE (COMPOSITION); SUBSTRATES;

AMORPHOUS GERMANIUM CARBON ALLOY; INFRARED TRANSMISSION ABSORPTION SPECTROSCOPY; OPTICAL GAP;

AMORPHOUS FILMS;

EID: 0031381813     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-467-537     Document Type: Conference Paper

References (16)