Absorption study of microcrystalline silicon deposited hot-wire CVD

Materials Research Society Symposium - Proceedings

Volumn 467, Issue , 1997, Pages 451-456

  Diehl, F ^a   Herbst, W ^a   Schroder, B ^a   Oechsner, H ^a  

^a France   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; BAND STRUCTURE; CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; ELECTRON TRANSITIONS; FILM PREPARATION; LIGHT ABSORPTION; VOLUME FRACTION; X RAY DIFFRACTION ANALYSIS;

BAND GAP; HOT WIRE CHEMICAL VAPOR DEPOSITION; INTERBAND TRANSITION; MICROCRYSTALLINE SILICON; PHOTOTHERMAL DEFLECTION SPECTROSCOPY;

SEMICONDUCTING SILICON;

EID: 0031381021     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)