메뉴 건너뛰기




Volumn 142, Issue 1-4, 1997, Pages 497-515

Disordering and annealing of a Si surface under low-energy Si bombardment

Author keywords

Amorphization; Defect annealing; Ion induced defects

Indexed keywords

AMORPHIZATION; ANNEALING; COMPUTER SIMULATION; ION BOMBARDMENT; MOLECULAR DYNAMICS; ORDER DISORDER TRANSITIONS; POINT DEFECTS; RADIATION DAMAGE;

EID: 0031376407     PISSN: 10420150     EISSN: None     Source Type: Journal    
DOI: 10.1080/10420159708211630     Document Type: Article
Times cited : (5)

References (11)
  • 11
    • 0012227848 scopus 로고
    • Point Defects in Semiconductors II
    • Springer, Berlin, Heidelberg, New York
    • J. Bourgoin and M. Lannoo, Point Defects in Semiconductors II, Springer Series in Solid-State Sciences 35 (Springer, Berlin, Heidelberg, New York, 1983).
    • (1983) Springer Series in Solid-State Sciences , pp. 35
    • Bourgoin, J.1    Lannoo, M.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.