Metal deposition near the tip of a scanning tunneling microscope

Journal of Electroanalytical Chemistry

Volumn 440, Issue 1-2, 1997, Pages 169-172

  Divisek, J ^a   Steffen, B ^a   Stimming, U ^a   Schmickler, Wolfgang ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL METHODS; COPPER; CURRENT DENSITY; IONS; MATHEMATICAL MODELS; SCANNING TUNNELING MICROSCOPY; SHIELDING;

SHIELDING EFFECTS;

DEPOSITION;

EID: 0031376304     PISSN: 00220728     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0728(97)00176-9     Document Type: Article

References (5)