Photoinduced hole-doping effect in Y0.5Ca0.5Ba2Cu3Oδ films

Applied Physics Letters

Volumn 71, Issue 22, 1997, Pages 3284-3286

  Lin, C L ^a   Lin, Y K ^a   Chi, C C ^a   Guan, W Y ^a   Wu, M K ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DEPOSITION; ELECTRIC CONDUCTIVITY; ELECTRIC VARIABLES MEASUREMENT; HALL EFFECT; LASER BEAM EFFECTS; OXYGEN; SEMICONDUCTOR DOPING; X RAY DIFFRACTION; YTTRIUM COMPOUNDS;

HALL MEASUREMENT; HOLE DOPING EFFECT; LASER DEPOSITION;

THIN FILMS;

EID: 0031375778     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.120323     Document Type: Article

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