3.3 μm pyrometry in single sided RTA from 400-700 °C using in-situ measurement of reflection and transmission

Materials Research Society Symposium - Proceedings

Volumn 470, Issue , 1997, Pages 23-28

  Marcy, D L ^a   Chial, S ^a   Benes, M ^a   Sturm, J C ^a  

^a PRINCETON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; LIGHT EMISSION; LIGHT REFLECTION; LIGHT TRANSMISSION; OPTICAL VARIABLES MEASUREMENT; PYROMETRY; SEMICONDUCTOR DOPING; THERMAL EFFECTS; THERMOCOUPLES; TRANSPARENCY;

RAPID THERMAL CHEMICAL VAPOR DEPOSITION;

SILICON WAFERS;

EID: 0031374660     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-470-23     Document Type: Conference Paper

References (2)