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Volumn 470, Issue , 1997, Pages 49-56
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Rapid thermal annealing and oxidation of silicon wafers with back-side films
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
ARSENIC;
BORON;
ION IMPLANTATION;
LIGHT EMISSION;
PYROMETERS;
TEMPERATURE CONTROL;
THERMOOXIDATION;
RAPID THERMAL OXIDATION;
SILICON WAFERS;
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EID: 0031374658
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-470-49 Document Type: Conference Paper |
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Times cited : (5)
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References (4)
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