Influence of fluorine desorption from ECR-CVD SiOF film

Materials Research Society Symposium - Proceedings

Volumn 476, Issue , 1997, Pages 69-74

  Usami, Tatsuya ^a   Ishikawa, Hiraku ^a   Gomi, Hideki ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DESORPTION; ELECTRON CYCLOTRON RESONANCE; FLUORINE COMPOUNDS; SILICON COMPOUNDS;

SILICON TETRAFLUORIDE;

DIELECTRIC FILMS;

EID: 0031372933     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-476-69     Document Type: Conference Paper

References (11)