Reliability evaluation of ultrathin gate oxides grown on Si wafers stored in clean stocker with a UV/photoelectron source

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings

Volumn , Issue , 1997, Pages

  Tobimatsu, H ^a   Mizubayashi, W ^a   Fujii, T ^a   Shibahara, K ^a   Yokoyama, S ^a   Hirose, M ^a  

^a HIROSHIMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSTS; ELECTRIC FIELD EFFECTS; GATES (TRANSISTOR); SEMICONDUCTOR DEVICE TESTING; SILICON WAFERS;

PHOTOCATALYST METHOD;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031370330     PISSN: 10788743     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)