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Volumn , Issue , 1997, Pages 299-302
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Rhenium silicide thin films: Structural analysis of the ReSi2-δ-phase
a
a
IFW DRESDEN
(Germany)
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS FILMS;
ANNEALING;
CRYSTALLINE MATERIALS;
CRYSTALLIZATION;
MAGNETRON SPUTTERING;
RHENIUM COMPOUNDS;
SILICON WAFERS;
STOICHIOMETRY;
THIN FILMS;
X RAY POWDER DIFFRACTION;
RHENIUM SILICIDE THIN FILMS;
SEMICONDUCTING FILMS;
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EID: 0031370316
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
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Times cited : (3)
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References (14)
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