Physical properties of spin-on solution deposited Bi4Ti3O12 thin films on Si substrates

Ferroelectrics

Volumn 201, Issue 1-4, 1997, Pages 157-165

  Alexe, M ^a   Pignolet, A ^a   Senz, S ^a   Hesse, D ^a  

^a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; BISMUTH COMPOUNDS; OXIDES; PERMITTIVITY; REFRACTIVE INDEX; SILICON WAFERS; THIN FILMS; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS;

BISMUTH TITANATE; MIXED OXIDES;

FERROELECTRIC MATERIALS;

EID: 0031369160     PISSN: 00150193     EISSN: None     Source Type: Journal    
DOI: 10.1080/00150199708228364     Document Type: Article

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