Analysis of x-ray mask distortion

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3096, Issue , 1997, Pages 260-268

  Tanaka, Yuusuke ^a   Yoshihara, Takuya ^a   Tsuboi, Shinji ^a   Fujii, Kiyoshi ^a   Suzuki, Katsumi ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; MEMBRANES; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON CARBIDE; SILICON NITRIDE; TANTALUM; X RAY LITHOGRAPHY;

MEMBRANE MASKS;

MASKS;

EID: 0031368732     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.277274     Document Type: Conference Paper

References (10)