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Volumn 3096, Issue , 1997, Pages 260-268
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Analysis of x-ray mask distortion
a
a
NEC CORPORATION
(Japan)
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Author keywords
[No Author keywords available]
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Indexed keywords
ETCHING;
MEMBRANES;
SEMICONDUCTOR DEVICE MANUFACTURE;
SILICON CARBIDE;
SILICON NITRIDE;
TANTALUM;
X RAY LITHOGRAPHY;
MEMBRANE MASKS;
MASKS;
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EID: 0031368732
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.277274 Document Type: Conference Paper |
Times cited : (2)
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References (10)
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