Microcrystalline silicon from very high frequency plasma deposition and hot-wire CVD for `micromorph' tandem solar cells

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 1997, Pages 679-682

  Brummack, H ^a   Brueggemann, R ^a   Wanka, H N ^a   Hierzenberger, A ^a   Schubert, M B ^a  

^a UNIVERSITY OF STUTTGART   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; CRYSTALLINE MATERIALS; ELECTRONIC PROPERTIES; FILM GROWTH; GLOW DISCHARGES; OPTICAL PROPERTIES; PLASMA APPLICATIONS; QUANTUM EFFICIENCY; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON;

HOT WIRE CHEMICAL VAPOR DEPOSITION; MICROCRYSTALLINE SILICON; MICROMORPH TANDEM SOLAR CELLS; PLASMA DEPOSITION;

SILICON SOLAR CELLS;

EID: 0031366899     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (15)